Experimental Evidence of Voltage-Dependence of Voltage Acceleration Factors for Ultra-Thin Gate Oxides

E.Y. Wu, A. Vayshenker, E. Nowak, J. Suñé, R.P. Vollertsen, W. Lai, D. Harmon

Research output: Contribution to journal › Article › Research

Original language	English
Pages (from-to)	2244-2253
Journal	IEEE Transactions on Electron Devices
Volume	49
Publication status	Published - 1 Jan 2002

Cite this

@article{fc17841511c54b1bbe93b7d815b79ae4,

title = "Experimental Evidence of Voltage-Dependence of Voltage Acceleration Factors for Ultra-Thin Gate Oxides",

author = "E.Y. Wu and A. Vayshenker and E. Nowak and J. Su{\~n}{\'e} and R.P. Vollertsen and W. Lai and D. Harmon",

year = "2002",

month = jan,

day = "1",

language = "English",

volume = "49",

pages = "2244--2253",

}