Experimental Evidence of Voltage-Dependence of Voltage Acceleration Factors for Ultra-Thin Gate Oxides

E.Y. Wu, A. Vayshenker, E. Nowak, J. Suñé, R.P. Vollertsen, W. Lai, D. Harmon

    Research output: Contribution to journalArticleResearch

    113 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)2244-2253
    JournalIEEE Transactions on Electron Devices
    Volume49
    Publication statusPublished - 1 Jan 2002

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