Electron beam lithography for contacting single nanowires on non-flat suspended substrates

Jordi Samà, Guillem Domènech-Gil, Isabel Gràcia, Xavier Borrisé, Carles Cané, Sven Barth, Frederik Steib, Andreas Waag, Juan Daniel Prades, Albert Romano-Rodríguez

    Research output: Contribution to journalArticleResearch

    1 Citation (Scopus)

    Abstract

    © 2019 Elsevier B.V. A methodology based on the use of Electron Beam Lithography for contacting individual nanowires on top of non-flat micromembranes and microhotplates has been implemented, and the practical details have been exhaustively described. The different fabrication steps have been adapted to the substrate's topology, requiring specific holders and conditions. The methodology is demonstrated on individual SnO2 nanowires, which, after fabrication, have been characterized as functional resistive gas nanosensors towards NH3 and benchmarked against similar devices fabricated using more conventional Dual Beam Focused Ion Beam techniques, demonstrating the superior properties of the here presented methodology, which can be further extended to other non-conventional suspended substrates and nanomaterials.
    Original languageEnglish
    Pages (from-to)616-623
    JournalSensors and Actuators, B: Chemical
    Volume286
    DOIs
    Publication statusPublished - 1 May 2019

    Keywords

    • EBL fabrication
    • Gas sensor
    • Individual nanowire
    • Metal oxide
    • Microhotplates

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