Electrodeposited Ni-Based Magnetic Mesoporous Films as Smart Surfaces for Atomic Layer Deposition: An "all-Chemical" Deposition Approach toward 3D Nanoengineered Composite Layers

Jin Zhang, Alberto Quintana, Enric Menéndez, Mariona Coll, Eva Pellicer, Jordi Sort

Research output: Contribution to journalArticleResearchpeer-review

7 Citations (Scopus)

Abstract

© 2018 American Chemical Society. Mesoporous Ni and Cu-Ni (Cu20Ni80 and Cu45Ni55 in at. %) films, showing a three-dimensional (3D) porous structure and tunable magnetic properties, are prepared by electrodeposition from aqueous surfactant solutions using micelles of P-123 triblock copolymer as structure-directing entities. Pores between 5 and 30 nm and dissimilar space arrangements (continuous interconnected networks, circular pores, corrugated mesophases) are obtained depending on the synthetic conditions. X-ray diffraction studies reveal that the Cu-Ni films have crystallized in the face-centered cubic structure, are textured, and exhibit certain degree of phase separation, particularly those with a higher Cu content. Atomic layer deposition (ALD) is used to conformally coat the mesopores of Cu20Ni80 film with amorphous Al2O3, rendering multiphase "nano-in-meso" metal-ceramic composites without compromising the ferromagnetic response of the metallic scaffold. From a technological viewpoint, these 3D nanoengineered composite films could be appealing for applications like magnetically actuated micro/nanoelectromechanical systems (MEMS/NEMS), voltage-driven magneto-electric devices, capacitors, or as protective coatings with superior strength and tribological performance.
Original languageEnglish
Pages (from-to)14877-14885
JournalACS Applied Materials and Interfaces
Volume10
Issue number17
DOIs
Publication statusPublished - 2 May 2018

Keywords

  • atomic layer deposition
  • magnetic properties
  • mesoporous films
  • nanoengineered composites
  • surfactant-assisted electrodeposition

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