Electrical characterization of stressed and broken down SiO2 films at a nanometer scale using a conducting atomic force microscope

M. Porti, M. Nafría, X. Aymerich, A. Olbrich, B. Ebersberger

    Research output: Contribution to journalArticleResearch

    Original languageEnglish
    Pages (from-to)1-1
    JournalVirtual journal of nanoscale science & technology
    Volume5
    Issue number6
    Publication statusPublished - 1 Feb 2002

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