Original language | English |
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Pages (from-to) | 1-1 |
Journal | Virtual journal of nanoscale science & technology |
Volume | 5 |
Issue number | 6 |
Publication status | Published - 1 Feb 2002 |
Electrical characterization of stressed and broken down SiO2 films at a nanometer scale using a conducting atomic force microscope
M. Porti, M. Nafría, X. Aymerich, A. Olbrich, B. Ebersberger
Research output: Contribution to journal › Article › Research