Design issues involved in the development of a membrane-based high-temperature nanocalorimeter

A. F. Lopeandía, E. León-Gutierrez, J. Rodríguez-Viejo, F. J. Muñoz

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20 Citations (Scopus)


In this contribution, we present a membrane-based nanocalorimeter that is capable of measuring the heat released or absorbed during a phase transformation in ultrathin films at temperatures up to 1300 K. Standard semiconductor processing techniques are used to fabricate the microreactors. Heating and sensing is typically performed using Pt(100 nm)/Ti(10 nm) thin films covered by 150 nm of Al2O3 to ensure high-temperature electrical stability, a key point to perform reproducible nanocalorimetric measurements. The 180 nm SiNx membrane is mechanically stable for temperatures below 1250 K. We demonstrate the use of the scanning nanocalorimeter to measure solid-to-liquid transitions occurring in a 3 nm nc-Ge layer sandwiched between 10 nm SiO2 thin films. © 2007 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)1288-1291
JournalMicroelectronic Engineering
Publication statusPublished - 1 May 2007


  • Ge thin film
  • High-temperature stability
  • Membrane-based microsystems
  • Nanocalorimetry


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