Deposition of epitaxial α-Fe<inf>2</inf>O<inf>3</inf> layers for exchange bias studies by reactive dc magnetron sputtering

C. Leighton, A. Hoffmann, M. R. Fitzsimmons, J. Nogués, Ivan K. Schuller

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7 Citations (Scopus)

Abstract

We describe the deposition and characterization of epitaxial thin films of the iron oxide haematite (α-Fe2O3), a promising candidate for fundamental studies of exchange anisotropy as well as for high thermal stability applications. The films were deposited by reactive dc magnetron sputtering. Structural characterization was by large-angle X-ray diffraction and grazing-incidence reflectivity (with the scattering vector normal to the sample plane), in-plane grazing-incidence diffraction (scattering vector in the sample plane) and reflection high-energy electron diffraction. Optimized sputtering conditions result in good epitaxy both in the growth direction and in the plane, as well as very smooth surfaces.
Original languageEnglish
Pages (from-to)1927-1934
JournalPhilosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties
Volume81
Issue number12
DOIs
Publication statusPublished - 1 Dec 2001

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