Abstract
We describe the deposition and characterization of epitaxial thin films of the iron oxide haematite (α-Fe2O3), a promising candidate for fundamental studies of exchange anisotropy as well as for high thermal stability applications. The films were deposited by reactive dc magnetron sputtering. Structural characterization was by large-angle X-ray diffraction and grazing-incidence reflectivity (with the scattering vector normal to the sample plane), in-plane grazing-incidence diffraction (scattering vector in the sample plane) and reflection high-energy electron diffraction. Optimized sputtering conditions result in good epitaxy both in the growth direction and in the plane, as well as very smooth surfaces.
Original language | English |
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Pages (from-to) | 1927-1934 |
Journal | Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties |
Volume | 81 |
Issue number | 12 |
DOIs | |
Publication status | Published - 1 Dec 2001 |