Deposited thin SiO2 for gate oxide on n-type and p-type GaN

M. Placidi, A. Constant, A. Fontser̀, E. Pausas, I. Cortes, Y. Cordier, N. Mestres, R. Ṕrez, M. Zabala, J. Millán, P. Godignon, A. Ṕérez-Tomás

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