Degradation of polycrystalline HfO<inf>2</inf>-based gate dielectrics under nanoscale electrical stress

V. Iglesias, M. Lanza, K. Zhang, A. Bayerl, M. Porti, M. Nafria, X. Aymerich, G. Benstteter, Z. Y. Shen, G. Bersuker

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35 Citations (Scopus)

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Physics & Astronomy