Degradation of high-K La2O3 gate dielectrics using progressive electrical stress

E. Miranda, J. Molina, Y. Kim, H. Iwai

Research output: Contribution to journalArticleResearch

18 Citations (Scopus)
Original languageEnglish
Pages (from-to)1365-1369
JournalMicroelectronics and Reliability
Volume45
DOIs
Publication statusPublished - 1 Jan 2005

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