Crystallization and silicon diffusion nanoscale effects on the electrical properties of Al<inf>2</inf>O<inf>3</inf> based devices

M. Lanza, M. Porti, M. Nafria, X. Aymerich, G. Benstetter, E. Lodermeier, H. Ranzinger, G. Jaschke, S. Teichert, L. Wilde, P. Michalowski

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