CR-39 registration efficiency of protons using electrochemical etching

F. Fernandez; C. Baixeras; M. Zamani; D. Lopez; S. Jokic; M. Debeauvais; J. Ralarosy

CR-39 registration efficiency of protons using electrochemical etching

F. Fernandez, C. Baixeras, M. Zamani, D. Lopez, S. Jokic, M. Debeauvais, J. Ralarosy

Department of Physics

Research output: Contribution to journal › Article › Research › peer-review

7 Citations (Scopus)

Abstract

The response of CR-39 to protons of energies ranging from 300 keV to 2 MeV at different incidence angles was studied using electrochemical etching (ECE). A power supply giving up to 2 kV(rms) at variable frequency between 0.3 and 6.5 kHz was used. In order to reduce background tracks and to obtain the best reproducibility a pre-etching was carried out before irradiation. Position effects of the electrodes were studied. An optimum distance was found to be dependent on ECE conditions: for 32 kV · cm-1, 2.5 kHz and 6N KOH solution at 50°C this distance was found to be 2.2 cm. The detection efficiency results obtained for protons were presented as a function of their energy and the incidence angle.

Original language	English
Pages (from-to)	175-178
Journal	Radiation Protection Dosimetry
Volume	23
Issue number	1-4
Publication status	Published - 1 Jan 1988

Cite this

@article{023acf02a00c49a7a55d6d0a7c5378c6,

title = "CR-39 registration efficiency of protons using electrochemical etching",

abstract = "The response of CR-39 to protons of energies ranging from 300 keV to 2 MeV at different incidence angles was studied using electrochemical etching (ECE). A power supply giving up to 2 kV(rms) at variable frequency between 0.3 and 6.5 kHz was used. In order to reduce background tracks and to obtain the best reproducibility a pre-etching was carried out before irradiation. Position effects of the electrodes were studied. An optimum distance was found to be dependent on ECE conditions: for 32 kV · cm-1, 2.5 kHz and 6N KOH solution at 50°C this distance was found to be 2.2 cm. The detection efficiency results obtained for protons were presented as a function of their energy and the incidence angle.",

author = "F. Fernandez and C. Baixeras and M. Zamani and D. Lopez and S. Jokic and M. Debeauvais and J. Ralarosy",

year = "1988",

month = jan,

day = "1",

language = "English",

volume = "23",

pages = "175--178",

number = "1-4",

}

TY - JOUR

T1 - CR-39 registration efficiency of protons using electrochemical etching

AU - Fernandez, F.

AU - Baixeras, C.

AU - Zamani, M.

AU - Lopez, D.

AU - Jokic, S.

AU - Debeauvais, M.

AU - Ralarosy, J.

PY - 1988/1/1

Y1 - 1988/1/1

N2 - The response of CR-39 to protons of energies ranging from 300 keV to 2 MeV at different incidence angles was studied using electrochemical etching (ECE). A power supply giving up to 2 kV(rms) at variable frequency between 0.3 and 6.5 kHz was used. In order to reduce background tracks and to obtain the best reproducibility a pre-etching was carried out before irradiation. Position effects of the electrodes were studied. An optimum distance was found to be dependent on ECE conditions: for 32 kV · cm-1, 2.5 kHz and 6N KOH solution at 50°C this distance was found to be 2.2 cm. The detection efficiency results obtained for protons were presented as a function of their energy and the incidence angle.

AB - The response of CR-39 to protons of energies ranging from 300 keV to 2 MeV at different incidence angles was studied using electrochemical etching (ECE). A power supply giving up to 2 kV(rms) at variable frequency between 0.3 and 6.5 kHz was used. In order to reduce background tracks and to obtain the best reproducibility a pre-etching was carried out before irradiation. Position effects of the electrodes were studied. An optimum distance was found to be dependent on ECE conditions: for 32 kV · cm-1, 2.5 kHz and 6N KOH solution at 50°C this distance was found to be 2.2 cm. The detection efficiency results obtained for protons were presented as a function of their energy and the incidence angle.

M3 - Article

VL - 23

SP - 175

EP - 178

IS - 1-4

ER -

CR-39 registration efficiency of protons using electrochemical etching

Abstract

Fingerprint

Cite this