Contact end resistance test structure applied for nanocontact measurements

J. Santander, I. Martin-Fernandez, X. Borrisé, G. Rius, C. Cané

    Research output: Contribution to journalArticleResearchpeer-review

    Abstract

    This paper presents an accurate method and test structure to evaluate ohmic nanocontacts. The procedure permits the characterization of the contact resistance between standard-in-microtechnology interconnect lines and a certain nanoscaled-in-width object. It is based on the adaption of the classic contact end resistance structure used for the measurement of the contact end resistance in microelectronic technologies. After the theoretical model study, the methodology is validated for the single-walled carbon nanotube case. © 2012 Elsevier B.V. All rights reserved.
    Original languageEnglish
    Pages (from-to)18-22
    JournalMicroelectronic Engineering
    Volume99
    DOIs
    Publication statusPublished - 1 Nov 2012

    Keywords

    • Contact resistance
    • Nanocontact
    • Test structure

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  • Cite this

    Santander, J., Martin-Fernandez, I., Borrisé, X., Rius, G., & Cané, C. (2012). Contact end resistance test structure applied for nanocontact measurements. Microelectronic Engineering, 99, 18-22. https://doi.org/10.1016/j.mee.2012.05.013