Comparison of standard macroscopic and conductive atomic force microscopy leakage measurements on gate removed high-k capacitors

W. Polspoel, W. Vandervorst, L. Aguilera, M. Porti, M. Nafría, X. Aymerich

Research output: Contribution to journalArticleResearch

4 Citations (Scopus)
Original languageEnglish
Pages (from-to)356-359
JournalJournal of vacuum science & technology. B
Issue number1
Publication statusPublished - 1 Jan 2009

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