Comparison of standard macroscopic and conductive atomic force microscopy leakage measurements on gate removed high-k capacitors

W. Polspoel, W. Vandervorst, L. Aguilera, M. Porti, M. Nafría, X. Aymerich

Research output: Contribution to journal › Article › Research

Original language	English
Pages (from-to)	356-359
Journal	Journal of vacuum science & technology. B
Volume	27
Issue number	1
Publication status	Published - 1 Jan 2009

Cite this

@article{b4b7f391eb464c8eb6029f2ea1052ffd,

title = "Comparison of standard macroscopic and conductive atomic force microscopy leakage measurements on gate removed high-k capacitors",

author = "W. Polspoel and W. Vandervorst and L. Aguilera and M. Porti and M. Nafr{\'i}a and X. Aymerich",

year = "2009",

month = jan,

day = "1",

language = "English",

volume = "27",

pages = "356--359",

number = "1",

}