Combining laser and jumping mode AFM lithography on aluminum for the fabrication of nanoelectromechanical devices

G. Abadal, Z. J. Davis, A. Boisen, F. Pérez-Murano, N. Barniol, X. Borrisé

    Research output: Contribution to journalReview articleResearchpeer-review

    11 Citations (Scopus)

    Abstract

    Laser lithography on Al can be used to fabricate sub-micron resonating cantilevers, which can be applied as high sensitivity and high resolution mass sensors. Normally, a linewidth below one micrometer is achieved by this technique. The linewidth can be reduced and thus the performance of the device can be improved by combining AFM and laser lithography. Nanoscale modification by AFM lithography on a pre-defined laser written structure is described. An improvement of the AFM alignment to the pre-defined laser written structure and a significant preservation of the AFM tip quality are achieved by the use of an intermittent contact AFM mode called Jumping Mode AFM. Applying a voltage between tip and sample increases the contrast in the adhesion images obtained by the Jumping Mode AFM.
    Original languageEnglish
    Pages (from-to)121-128
    JournalProbe Microscopy
    Volume2
    Issue number2
    Publication statusPublished - 1 Dec 2001

    Keywords

    • Adhesion mode
    • AFM
    • Laser
    • Nanolithography
    • Nanomechanical
    • Resonant sensors

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