Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems

G. Abadal, A. Boisen, Z. J. Davis, O. Hansen, F. Grey

    Research output: Contribution to journalArticleResearchpeer-review

    21 Citations (Scopus)

    Abstract

    A simple, flexible, and resistless mask fabrication technique for the definition of nanoelectromechanical devices is presented. Atomic force microscope (AFM) lithography was used to locally oxidize laser-defined Al masks, and the oxidized regions were removed. The combination of AFM and laser writing is advantageous because it is much faster than using AFM alone and it reduces wear of the AFM tip, while still ensuring mechanical and electrical integrity of the fine AFM written structures and the larger scale laser written patterns.
    Original languageEnglish
    Pages (from-to)3206-3208
    JournalApplied Physics Letters
    Volume74
    DOIs
    Publication statusPublished - 24 May 1999

    Fingerprint Dive into the research topics of 'Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems'. Together they form a unique fingerprint.

    Cite this