Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems

G. Abadal; A. Boisen; Z. J. Davis; O. Hansen; F. Grey

doi:https://doi.org/10.1063/1.124106

Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems

G. Abadal, A. Boisen, Z. J. Davis, O. Hansen, F. Grey

Research output: Contribution to journal › Article › Research › peer-review

21 Citations (Scopus)

Abstract

A simple, flexible, and resistless mask fabrication technique for the definition of nanoelectromechanical devices is presented. Atomic force microscope (AFM) lithography was used to locally oxidize laser-defined Al masks, and the oxidized regions were removed. The combination of AFM and laser writing is advantageous because it is much faster than using AFM alone and it reduces wear of the AFM tip, while still ensuring mechanical and electrical integrity of the fine AFM written structures and the larger scale laser written patterns.

Original language	English
Pages (from-to)	3206-3208
Journal	Applied Physics Letters
Volume	74
DOIs	https://doi.org/10.1063/1.124106
Publication status	Published - 24 May 1999

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abstract = "A simple, flexible, and resistless mask fabrication technique for the definition of nanoelectromechanical devices is presented. Atomic force microscope (AFM) lithography was used to locally oxidize laser-defined Al masks, and the oxidized regions were removed. The combination of AFM and laser writing is advantageous because it is much faster than using AFM alone and it reduces wear of the AFM tip, while still ensuring mechanical and electrical integrity of the fine AFM written structures and the larger scale laser written patterns.",

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AB - A simple, flexible, and resistless mask fabrication technique for the definition of nanoelectromechanical devices is presented. Atomic force microscope (AFM) lithography was used to locally oxidize laser-defined Al masks, and the oxidized regions were removed. The combination of AFM and laser writing is advantageous because it is much faster than using AFM alone and it reduces wear of the AFM tip, while still ensuring mechanical and electrical integrity of the fine AFM written structures and the larger scale laser written patterns.

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