CMOS-SOI platform for monolithic integration of crystalline silicon MEMS

M. Villarroya, E. Figueras, J. Verd, J. Teva, G. Abadal, F. Pérez-Murano, J. Montserrat, A. Uranga, J. Esteve, N. Barniol

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Abstract

A new platform for the fabrication of crystalline micro- and nano-electromechanical systems fully integrable with CMOS is presented. A pre-CMOS process on SOI wafers allows bulk silicon areas for standard CMOS processing and areas with a stack layer of silicon and silicon oxide to be obtained, in which a set of microelectromechanical devices can be fabricated. An integrated resonant beam system with electrical actuation and detection fabricated according to the presented approach is provided.
Original languageEnglish
Pages (from-to)800-801
JournalElectronics Letters
Volume42
DOIs
Publication statusPublished - 6 Jul 2006

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    Villarroya, M., Figueras, E., Verd, J., Teva, J., Abadal, G., Pérez-Murano, F., Montserrat, J., Uranga, A., Esteve, J., & Barniol, N. (2006). CMOS-SOI platform for monolithic integration of crystalline silicon MEMS. Electronics Letters, 42, 800-801. https://doi.org/10.1049/el:20061097