CMOS-SOI platform for monolithic integration of crystalline silicon MEMS

M. Villarroya, E. Figueras, J. Verd, J. Teva, G. Abadal, F. Pérez-Murano, J. Montserrat, A. Uranga, J. Esteve, N. Barniol

Research output: Contribution to journalArticleResearchpeer-review

1 Citation (Scopus)


A new platform for the fabrication of crystalline micro- and nano-electromechanical systems fully integrable with CMOS is presented. A pre-CMOS process on SOI wafers allows bulk silicon areas for standard CMOS processing and areas with a stack layer of silicon and silicon oxide to be obtained, in which a set of microelectromechanical devices can be fabricated. An integrated resonant beam system with electrical actuation and detection fabricated according to the presented approach is provided.

Original languageEnglish
Pages (from-to)800-801
Number of pages2
JournalElectronics Letters
Issue number14
Publication statusPublished - 6 Jul 2006


Dive into the research topics of 'CMOS-SOI platform for monolithic integration of crystalline silicon MEMS'. Together they form a unique fingerprint.

Cite this