Characterization of the Electrical Damage due to Polysilicon RIE(SF<inf>6</inf>+ CL<inf>2</inf>Plasma) Etching

E. Castán, A. De Dios, L. Bailón, J. Barbolla, E. Cabruja, C. Domínquez, E. Lora-Tamayo

Research output: Contribution to journal › Article › Research › peer-review

3 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Characterization of the Electrical Damage due to Polysilicon RIE(SF<inf>6</inf>+ CL<inf>2</inf>Plasma) Etching'. Together they form a unique fingerprint.

Material Science