Characterization of the electrical damage due to polysilicon RIE (SF6 + Cl2 plasma) etching

E. Castán, A. de Dios, L. Bailón, J. Barbolla, C. Dominguez E. Cabruja, LORA-TAMAYO E.

Research output: Contribution to journalArticleResearch

3 Citations (Scopus)
Original languageEnglish
Pages (from-to)193-195
JournalJournal of the Electrochemical Society
Volume139
Issue number1
Publication statusPublished - 1 Jan 1992

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