C-AFM Characterization of the Dependence of HfAlOx Electrical Behavior on Post Deposition Annealing Temperature.

X. Blasco, M. Nafría, X. Aymerich, J. Pétry, W. Vandervorst

Research output: Contribution to journalArticleResearch

25 Citations (Scopus)
Original languageEnglish
Pages (from-to)191-196
JournalMicroelectronic Engineering
Volume72
Issue number1-4
DOIs
Publication statusPublished - 1 Jan 2004

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