Breakdown spots of ultra-thin (EOT<1.5nm) HfO2/SiO2 stacks observed with enhanced-CAFM,

X. Blasco, M. Nafría, X. Aymerich, J. Pétry, W. Vandervorst

Research output: Contribution to journalArticleResearch

11 Citations (Scopus)
Original languageEnglish
Pages (from-to)811-814
JournalMicroelectronics and Reliability
Volume45
Issue number5-6
DOIs
Publication statusPublished - 1 Jan 2005

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