Original language | English |
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Pages (from-to) | 811-814 |
Journal | Microelectronics and Reliability |
Volume | 45 |
Issue number | 5-6 |
DOIs | |
Publication status | Published - 1 Jan 2005 |
Breakdown spots of ultra-thin (EOT<1.5nm) HfO2/SiO2 stacks observed with enhanced-CAFM,
X. Blasco, M. Nafría, X. Aymerich, J. Pétry, W. Vandervorst
Research output: Contribution to journal › Article › Research
11
Citations
(Scopus)