Original language | Undefined/Unknown |
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Place of Publication | Toulouse. (FR) |
Number of pages | 0 |
Publication status | Published - Jun 1998 |
Book of Abstracts of the 9th Workshop Dielectrics in Microelectronics. "Two-step stress tests for the assessment of the dynamic reliabiilty of very thin (8nm) SiO2 films". Book of Abstracts of the 9th Workshop Dielectrics in Microelectronics.
R. Rodríguez, E. Miranda, M. Nafría, J. Suñé, X. Aymerich, d'Analyse et d'Architecture des Systèmes (LAAS-CNRS) Laboratore (Editor)
Research output: Book/Report › Proceeding › Research