Atomic Force Microscope topographical artifacts after the dielectric breakdown of ultrathin SiO2 films.

M. Porti, M. Nafría, M. C. Blüm, X. Aymerich, S. Sadewasser

    Research output: Contribution to journalArticleResearch

    26 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)727-731
    JournalSurface Science
    Volume532
    Issue number535
    Publication statusPublished - 1 Jan 2003

    Cite this