Assessment of the variability of the I-V characteristic of HfO2-based resistive switching devices and its simulation using the quasi-static memdiode model

Emili Salvador Aguilera, Mireia Bargallo Gonzalez, Francesca Campabadal, Javier Martin-Martinez, Rosana Rodriguez, Enrique Miranda

Research output: Contribution to journalArticleResearchpeer-review

3 Citations (Scopus)

Abstract

Variability of the conduction characteristics of filamentary-type resistive switching devices or resistive RAMs (RRAMs) is a hot research topic both in academia and industry because it is currently considered one of the major showstoppers for the successful development and application of this technology. In this work, we thoroughly investigate the statistics of the cycle-to-cycle (C2C) variability observed in the experimental current-voltage (I-V) curves of HfO-based memristive structures using the fitdistrplus package for the R language. This exploratory analysis allows us to identify which parametric probability distributions are the most suitable candidates for describing our data. This study involves graphical tools such as the density, skewness-kurtosis (S-K), and quantile-quantile (Q-Q) plots. The analysis is completed with the aid of goodness-of-fit statistics (Kolmogorov-Smirnov, Cramer-von Mises, Anderson-Darling) and criteria (Akaike's and Bayesian). The selected distributions are incorporated into the SPICE script of the quasi-static memdiode model for resistive switching devices and used for simulating uncorrelated C2C variability. Finally, a one-way sensitivity analysis is carried out in order to test the impact of the model parameters variation in the output characteristics of the device.
Original languageEnglish
Article number108667
Number of pages10
JournalSolid-State Electronics
Volume206
DOIs
Publication statusPublished - Aug 2023

Keywords

  • Memristor
  • Variability
  • Resistive switching
  • HfO2

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