Application of the Clustering Model to Time-Correlated Oxide Breakdown Events in Multilevel Antifuse Memory Cells

Jordi Munoz Gorriz*, Mireia Bargallo Gonzalez, Francesca Campabadal, Jordi Sune, Enrique A. Miranda

*Corresponding author for this work

Research output: Contribution to journalArticleResearchpeer-review

6 Citations (Scopus)

Abstract

Time statistics for successive breakdown (BD) events in Al2O3/HfO2-based nanolaminates aimed to the development of multilevel one-time programmable (OTP) memory cells is investigated. The clustering model is shown to account for the departure of the experimental data from the standard Weibull model attributed to the initial leakage current dispersion. An equivalent electrical circuit model is used to represent the stepwise current increase triggered by the appearance of multiple BD sites. Correlation effects in the order statistics are ascribed to a reduction of the effective stress voltage caused by the presence of a series resistance. It is shown that the E -model acceleration law for dielectric BD is consistent with the data obtained from our antifuse cells.

Original languageEnglish
Article number9239294
Pages (from-to)1770-1773
Number of pages4
JournalIEEE Electron Device Letters
Volume41
Issue number12
DOIs
Publication statusPublished - Dec 2020

Keywords

  • Clustering model
  • memory
  • one-time-programmable
  • OTP
  • oxide breakdown

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