Analysis of GeH<inf>4</inf> and GeF<inf>4</inf> as gaseous feed materials for germanium implantation

A. Ferreiro; J. du Port de Pontcharra; C. Jaussad; E. Lora-Tamayo

doi:10.1016/0042-207X(89)90035-3

Analysis of GeH<inf>4</inf> and GeF<inf>4</inf> as gaseous feed materials for germanium implantation

A. Ferreiro, J. du Port de Pontcharra, C. Jaussad, E. Lora-Tamayo

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Abstract

This paper reports the analysis of GeH4 and GeF4 as gaseous feed materials for Ge+ implantation. The study of this spectra, carried out with the help of the implanter analyser magnet, reveals the tremendous importance of their chemical differences. The tetrafluoride is found to be superior since (a) it does not produce any solid deposit that blocks the gas entrance, (b) it enables any desired germanium isotope to be implanted without risking the introduction of any other element, and (c) it produces ion intensities 6-10 times higher than the monogermane. © 1989.

Original language	English
Pages (from-to)	775-779
Journal	Vacuum
Volume	39
Issue number	7-8
DOIs	https://doi.org/10.1016/0042-207X(89)90035-3
Publication status	Published - 1 Jan 1989

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title = "Analysis of GeH4 and GeF4 as gaseous feed materials for germanium implantation",

abstract = "This paper reports the analysis of GeH4 and GeF4 as gaseous feed materials for Ge+ implantation. The study of this spectra, carried out with the help of the implanter analyser magnet, reveals the tremendous importance of their chemical differences. The tetrafluoride is found to be superior since (a) it does not produce any solid deposit that blocks the gas entrance, (b) it enables any desired germanium isotope to be implanted without risking the introduction of any other element, and (c) it produces ion intensities 6-10 times higher than the monogermane. {\textcopyright} 1989.",

author = "A. Ferreiro and {du Port de Pontcharra}, J. and C. Jaussad and E. Lora-Tamayo",

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AU - Ferreiro, A.

AU - du Port de Pontcharra, J.

AU - Jaussad, C.

AU - Lora-Tamayo, E.

PY - 1989/1/1

Y1 - 1989/1/1

N2 - This paper reports the analysis of GeH4 and GeF4 as gaseous feed materials for Ge+ implantation. The study of this spectra, carried out with the help of the implanter analyser magnet, reveals the tremendous importance of their chemical differences. The tetrafluoride is found to be superior since (a) it does not produce any solid deposit that blocks the gas entrance, (b) it enables any desired germanium isotope to be implanted without risking the introduction of any other element, and (c) it produces ion intensities 6-10 times higher than the monogermane. © 1989.

AB - This paper reports the analysis of GeH4 and GeF4 as gaseous feed materials for Ge+ implantation. The study of this spectra, carried out with the help of the implanter analyser magnet, reveals the tremendous importance of their chemical differences. The tetrafluoride is found to be superior since (a) it does not produce any solid deposit that blocks the gas entrance, (b) it enables any desired germanium isotope to be implanted without risking the introduction of any other element, and (c) it produces ion intensities 6-10 times higher than the monogermane. © 1989.

U2 - 10.1016/0042-207X(89)90035-3

DO - 10.1016/0042-207X(89)90035-3

M3 - Article

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EP - 779

JO - Vacuum

JF - Vacuum

IS - 7-8

ER -

Analysis of GeH<inf>4</inf> and GeF<inf>4</inf> as gaseous feed materials for germanium implantation

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