After-Breakdown Electrical Characterization of thin SiO2 Films

Research output: Contribution to journal › Article › Research

Original language	English
Pages (from-to)	141C-141C
Journal	Journal of the Electrochemical Society
Volume	137
Publication status	Published - 1 Jan 1990

Cite this

@article{03f60c9746e04285b3c8e6678e093181,

title = "After-Breakdown Electrical Characterization of thin SiO2 Films",

author = "J. Su{\~n}{\'e} and E. Farr{\'e}s and X. Aymerich",

year = "1990",

month = jan,

day = "1",

language = "English",

volume = "137",

pages = "141C--141C",

journal = "Journal of the Electrochemical Society",

issn = "0013-4651",

publisher = "Electrochemical Society, Inc.",

}