Adsorption of colloidal particles in the presence of external fields

I. Pagonabarraga; J. Bafaluy; J. M. Rubí

doi:https://doi.org/10.1103/PhysRevLett.75.461

Adsorption of colloidal particles in the presence of external fields

I. Pagonabarraga, J. Bafaluy, J. M. Rubí

Department of Physics

Research output: Contribution to journal › Article › Research › peer-review

18 Citations (Scopus)

Abstract

We present a new class of sequential adsorption models in which the adsorbing particles reach the surface following an inclined direction (shadow models). Capillary electrophoresis, adsorption in the presence of a shear, and adsorption on an inclined substrate are physical manifestations of these models. Numerical simulations are carried out to show how the new adsorption mechanisms are responsible for the formation of more ordered adsorbed layers and have important implications in the kinetics, in particular, modifying the jamming limit. © 1995 The American Physical Society.

Original language	English
Pages (from-to)	461-464
Journal	Physical Review Letters
Volume	75
DOIs	https://doi.org/10.1103/PhysRevLett.75.461
Publication status	Published - 1 Jan 1995

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title = "Adsorption of colloidal particles in the presence of external fields",

abstract = "We present a new class of sequential adsorption models in which the adsorbing particles reach the surface following an inclined direction (shadow models). Capillary electrophoresis, adsorption in the presence of a shear, and adsorption on an inclined substrate are physical manifestations of these models. Numerical simulations are carried out to show how the new adsorption mechanisms are responsible for the formation of more ordered adsorbed layers and have important implications in the kinetics, in particular, modifying the jamming limit. {\textcopyright} 1995 The American Physical Society.",

author = "I. Pagonabarraga and J. Bafaluy and Rub{\'i}, {J. M.}",

year = "1995",

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doi = "https://doi.org/10.1103/PhysRevLett.75.461",

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AU - Pagonabarraga, I.

AU - Bafaluy, J.

AU - Rubí, J. M.

PY - 1995/1/1

Y1 - 1995/1/1

N2 - We present a new class of sequential adsorption models in which the adsorbing particles reach the surface following an inclined direction (shadow models). Capillary electrophoresis, adsorption in the presence of a shear, and adsorption on an inclined substrate are physical manifestations of these models. Numerical simulations are carried out to show how the new adsorption mechanisms are responsible for the formation of more ordered adsorbed layers and have important implications in the kinetics, in particular, modifying the jamming limit. © 1995 The American Physical Society.

AB - We present a new class of sequential adsorption models in which the adsorbing particles reach the surface following an inclined direction (shadow models). Capillary electrophoresis, adsorption in the presence of a shear, and adsorption on an inclined substrate are physical manifestations of these models. Numerical simulations are carried out to show how the new adsorption mechanisms are responsible for the formation of more ordered adsorbed layers and have important implications in the kinetics, in particular, modifying the jamming limit. © 1995 The American Physical Society.

U2 - https://doi.org/10.1103/PhysRevLett.75.461

DO - https://doi.org/10.1103/PhysRevLett.75.461

M3 - Article

VL - 75

SP - 461

EP - 464

ER -

Adsorption of colloidal particles in the presence of external fields

Abstract

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