Two Pershore Stacks (32 h cure cycle and 1% DOP and 96 h cure cycle and no additive) have been exposed to the Berkeley Bevalac Argon beam at 285 MeV/nuc and 425 MeV/nuc, respectively. Optimum etching conditions have been found to be 70°C temperature and 18 h etching time in 6.25 N OHNa aquaeous solution, corresponding to a mean bulk etch rate VB = (1.37±0.09) μm/h. The charge and mass resolution power of the detector has been evaluated as ΔZ ≈ 0.3 e and ΔA ≈ 2 a.m.u.. © 1984.
|Journal||Nuclear Tracks and Radiation Measurements (1982)|
|Publication status||Published - 1 Jan 1984|
- charge and mass resolution power