A study of etching conditions and resolution power of plastic detector CR-39

C. Domingo, M. Ortega, F. Fernández, A. Vidal-Quadras, J. L. Font, C. Baixeras, M. Casas

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6 Citations (Scopus)

Abstract

Two Pershore Stacks (32 h cure cycle and 1% DOP and 96 h cure cycle and no additive) have been exposed to the Berkeley Bevalac Argon beam at 285 MeV/nuc and 425 MeV/nuc, respectively. Optimum etching conditions have been found to be 70°C temperature and 18 h etching time in 6.25 N OHNa aquaeous solution, corresponding to a mean bulk etch rate VB = (1.37±0.09) μm/h. The charge and mass resolution power of the detector has been evaluated as ΔZ ≈ 0.3 e and ΔA ≈ 2 a.m.u.. © 1984.
Original languageEnglish
Pages (from-to)17-20
JournalNuclear Tracks and Radiation Measurements (1982)
Volume8
Issue number1-4
DOIs
Publication statusPublished - 1 Jan 1984

Keywords

  • Argon
  • charge and mass resolution power
  • CR-39

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