A fast optical scanning deflectometer for measuring the topography of large silicon wafers

S. Krey, W.D. Van Amstel, J. Campos, A. Moreno, E.J. Lous

Research output: Contribution to journal › Article › Research

Access to Document

@article{3828ba4f93314477a961bd141966d901,

title = "A fast optical scanning deflectometer for measuring the topography of large silicon wafers",

author = "S. Krey and Amstel, {W.D. Van} and J. Campos and A. Moreno and E.J. Lous",

year = "2004",

month = jan,

day = "1",

doi = "10.1117/12.559702",

language = "English",

volume = "5523",

pages = "110--120",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

number = "12",

}

TY - JOUR

T1 - A fast optical scanning deflectometer for measuring the topography of large silicon wafers

AU - Krey, S.

AU - Amstel, W.D. Van

AU - Campos, J.

AU - Moreno, A.

AU - Lous, E.J.

PY - 2004/1/1

Y1 - 2004/1/1

U2 - 10.1117/12.559702

DO - 10.1117/12.559702

M3 - Article

VL - 5523

SP - 110

EP - 120

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

IS - 12

ER -