Keyphrases
Si1-xCx
100%
Cape
100%
Amorphous Films
66%
Chemical Vapor Deposition
66%
Polycrystalline Films
66%
Differential Thermal Analysis
33%
Deposition Parameters
33%
Layer Interface
33%
Substrate Layer
33%
Heat Treatment
33%
Thermal Characterization
33%
Low Pressure Chemical Vapor Deposition (LPCVD)
33%
Thermal Stability
33%
Structural Characterization
33%
Material Science
Chemical Vapor Deposition
100%
Film
100%
Heat Treatment
25%
Low Pressure Chemical Vapor Deposition
25%
Thermal Stability
25%
Amorphous Film
25%
Morphology
25%
Differential Thermal Analysis
25%
Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
75%
Polycrystalline
50%
Deposition Parameter
25%
Layer Interface
25%
Heat Treatment
25%