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Òxids de porta irradiats en tecnologies CMOS sub-0,1\mum: caracterització a escala nanomètrica i impacte en les prestacions de dispositius i circuits

Project Details

Description

The main objective of the proposed project, i.e. the investigation of the ionising radiation effects on MOS devices, can be divided in two seccondary objectives: 1. Impact of radiation on microelectronic devices/circuits: characterization and modelling. 2. Nanometer scale characterization of the radiation effects on the gate oxide reliability of MOS structures
StatusFinished
Effective start/end date1/01/0531/03/07

Collaborative partners

  • University of Padua (Coordinator) (lead)

Funding

  • Ministerio de Educación y Ciencia (MEC): €10,820.00

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