Keyphrases
Al-Ni
11%
Amorphous Alloy
19%
Annealing
13%
Bcc Fe
17%
Calorimetric Data
12%
Crystalline Si
12%
Crystallization
20%
Deposition Temperature
20%
Devitrification
18%
Differential Scanning Calorimetry
14%
Glass Transition
26%
Heat Capacity
26%
Heating Rate
38%
High Temperature
12%
Highly Stable
20%
In Situ
21%
Indomethacin
18%
Liquid Phase
12%
Low Pressure Chemical Vapor Deposition (LPCVD)
18%
Magnetic Properties
13%
Melt Spinning
15%
Membrane-based
17%
Metallic Glass
30%
Microreactor
13%
Microstructure
24%
Nanocalorimeter
17%
Nanocalorimetry
33%
Nanocrystalline
12%
Nanocrystallization
24%
Primary Crystallization
22%
Relaxation Time
13%
Ribbon
17%
Room Temperature
12%
Si Substrate
12%
Si(111)
18%
SiC Film
22%
Silica
29%
Single-crystalline
16%
Stable Glass
28%
Supercooled Liquid
18%
Temperature Effect
13%
Temperature Range
23%
Thermal Conductivity
40%
Thermodynamic Stability
12%
Toluene
27%
Ultra-thin Glass
36%
Ultrathin
17%
Ultrathin Films
23%
Vapor Deposition
14%
X Ray Diffraction
16%
Material Science
Amorphous Alloys
17%
Amorphous Material
9%
Anisotropy
16%
Annealing
17%
Calorimetry
15%
Chemical Vapor Deposition
18%
Crystallization
10%
Curie Temperature
11%
Dehydrogenation
7%
Density
28%
Dielectric Material
13%
Differential Scanning Calorimetry
18%
Diffusivity
7%
Fictive Temperature
16%
Film
100%
Film Thickness
8%
Germanium
7%
Glass Transition
28%
Glass Transition Temperature
15%
Grain Size
16%
Heat Treatment
13%
Hydrogenation
10%
Liquid
13%
Low Pressure Chemical Vapor Deposition
16%
Magnesium
10%
Magnetic Property
16%
Metallic Glass
38%
Molecular Beam Epitaxy
8%
Molecular Orientation
7%
Nanocrystalline
21%
Nanocrystallization
29%
Nanoparticle
12%
Nanowires
12%
Nucleation
36%
Phase Composition
20%
Photoluminescence
7%
Physical Vapor Deposition
13%
Quantum Dot
10%
Scanning Electron Microscopy
7%
Silicon
9%
Structural Relaxation
10%
Superlattice
9%
Surface (Surface Science)
38%
Thermal Conductivity
40%
Thermal Stability
12%
Thermoelectrics
16%
Thin Films
98%
Transmission Electron Microscopy
13%
Ultrathin Film
23%
X-Ray Diffraction
23%
Engineering
Amorphous Phase
10%
Calorimeter
21%
Chemical Vapor Deposition
7%
Continuous Heating
6%
Crystallite
7%
Deposited Film
10%
Deposition Temperature
8%
Early Stage
5%
Energy Engineering
8%
Good Agreement
6%
Heat Capacity
22%
Heat Treatment
7%
Heating Rate
33%
Interfacial Energy
7%
Isothermal
6%
Lateral Growth
5%
Liquid Phase
5%
Liquid Transition
6%
Low Thermal Conductivity
7%
Melt Spinning
7%
Melting Point
6%
Microreactor
13%
Nanocrystalline
10%
Nanocrystallization
11%
Nanoparticles
10%
Phase Mixture
6%
Quantum Dot
7%
Rate of Heating
14%
Ray Diffraction
16%
Relaxation Time
7%
Room Temperature
7%
Si Nanowires
5%
Si Substrate
10%
Silicon Dioxide
15%
Sio2 Layer
5%
Size Effect
5%
Superlattice
10%
Temperature Interval
8%
Temperature Range
9%
Thermal Conductivity
33%
Thermodynamic Stability
5%
Thermoelectricity
12%
Thin Films
76%
Vapor Deposition
14%
