YSZ thin films deposited on NiO-CSZ anodes by pulsed injection MOCVD for intermediate temperature SOFC applications

Gemma Garcia; Rosa Isabel Merino; Viktor Manuel Orera; Angel Larrea; José Ignacio Peña; Miguel Ángel Laguna-Bercero; José Ángel Pardo; José Santiso; Albert Figueras

doi:10.1002/cvde.200304173

YSZ thin films deposited on NiO-CSZ anodes by pulsed injection MOCVD for intermediate temperature SOFC applications

Gemma Garcia^*, Rosa Isabel Merino, Viktor Manuel Orera, Angel Larrea, José Ignacio Peña, Miguel Ángel Laguna-Bercero, José Ángel Pardo, José Santiso, Albert Figueras

^*Autor corresponent d’aquest treball

Departament de Física

Producció científica: Contribució a revista › Article › Recerca › Avaluat per experts

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Resum

The electrolyte-anode system was fabricated using a microstructured NiO-calcia stabilized zirconia (CSZ) eutectic. Yttria-stabilized zirconia (YSZ) thin films were deposited on NiO-CSZ anodes by pulsed injection MOCVD for intermediate temperature solid oxide fuel cell (SOFC) applications. The effect of oxygen pressure on nickle reduction was confirmed by X-ray diffraction. The results show that the assembly of YSZ films onto NiO-CSZ eutectic substrates that form a gas-tight anode-electrolyte system, is very promising for ITSOFC devices.

Idioma original	Anglès
Pàgines (de-a)	249-252
Nombre de pàgines	4
Revista	Chemical Vapor Deposition
Volum	10
Número	5
DOIs	https://doi.org/10.1002/cvde.200304173
Estat de la publicació	Publicada - d’oct. 2004

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@article{592c05c94304465bb76dd892a26fac97,

title = "YSZ thin films deposited on NiO-CSZ anodes by pulsed injection MOCVD for intermediate temperature SOFC applications",

abstract = "The electrolyte-anode system was fabricated using a microstructured NiO-calcia stabilized zirconia (CSZ) eutectic. Yttria-stabilized zirconia (YSZ) thin films were deposited on NiO-CSZ anodes by pulsed injection MOCVD for intermediate temperature solid oxide fuel cell (SOFC) applications. The effect of oxygen pressure on nickle reduction was confirmed by X-ray diffraction. The results show that the assembly of YSZ films onto NiO-CSZ eutectic substrates that form a gas-tight anode-electrolyte system, is very promising for ITSOFC devices.",

author = "Gemma Garcia and Merino, \{Rosa Isabel\} and Orera, \{Viktor Manuel\} and Angel Larrea and Pe{\~n}a, \{Jos{\'e} Ignacio\} and Laguna-Bercero, \{Miguel {\'A}ngel\} and Pardo, \{Jos{\'e} {\'A}ngel\} and Jos{\'e} Santiso and Albert Figueras",

year = "2004",

month = oct,

doi = "10.1002/cvde.200304173",

language = "English",

volume = "10",

pages = "249--252",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

number = "5",

}

TY - JOUR

T1 - YSZ thin films deposited on NiO-CSZ anodes by pulsed injection MOCVD for intermediate temperature SOFC applications

AU - Garcia, Gemma

AU - Merino, Rosa Isabel

AU - Orera, Viktor Manuel

AU - Larrea, Angel

AU - Peña, José Ignacio

AU - Laguna-Bercero, Miguel Ángel

AU - Pardo, José Ángel

AU - Santiso, José

AU - Figueras, Albert

PY - 2004/10

Y1 - 2004/10

N2 - The electrolyte-anode system was fabricated using a microstructured NiO-calcia stabilized zirconia (CSZ) eutectic. Yttria-stabilized zirconia (YSZ) thin films were deposited on NiO-CSZ anodes by pulsed injection MOCVD for intermediate temperature solid oxide fuel cell (SOFC) applications. The effect of oxygen pressure on nickle reduction was confirmed by X-ray diffraction. The results show that the assembly of YSZ films onto NiO-CSZ eutectic substrates that form a gas-tight anode-electrolyte system, is very promising for ITSOFC devices.

AB - The electrolyte-anode system was fabricated using a microstructured NiO-calcia stabilized zirconia (CSZ) eutectic. Yttria-stabilized zirconia (YSZ) thin films were deposited on NiO-CSZ anodes by pulsed injection MOCVD for intermediate temperature solid oxide fuel cell (SOFC) applications. The effect of oxygen pressure on nickle reduction was confirmed by X-ray diffraction. The results show that the assembly of YSZ films onto NiO-CSZ eutectic substrates that form a gas-tight anode-electrolyte system, is very promising for ITSOFC devices.

UR - https://www.scopus.com/pages/publications/10444241159

U2 - 10.1002/cvde.200304173

DO - 10.1002/cvde.200304173

M3 - Article

AN - SCOPUS:10444241159

SN - 0948-1907

VL - 10

SP - 249

EP - 252

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 5

ER -

YSZ thin films deposited on NiO-CSZ anodes by pulsed injection MOCVD for intermediate temperature SOFC applications

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