Study of the influence of nonuniforms pupils in photolithographic systems trough the apparent transfer function

M.J. Yzuel, R. Hild, J. Campos, J. C. Escalera

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Idioma original	English
Pàgines (de-a)	369-377
Revista	Proceedings of SPIE, The international Society for Optical Engineering
Volum	2774
DOIs	https://doi.org/10.1117/12.246680
Estat de la publicació	Publicada - 1 de gen. 1996

Accés al document

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