TY - JOUR
T1 - Passivation of Bi2Te3 topological insulator by transferred CVD-graphene :
T2 - toward intermixing-free interfaces
AU - Galceran, Regina
AU - Bonell, Frédéric
AU - Camosi, Lorenzo
AU - Sauthier, Guillaume
AU - Gebeyehu, Zewdu M.
AU - Esplandiu Egido, Maria José
AU - Arrighi, Aloïs
AU - Fernández Aguirre, Iván
AU - Figueroa García, Adriana Isabel
AU - Sierra, Juan F.
AU - Valenzuela, Sergio O.
PY - 2022
Y1 - 2022
N2 - The investigation, and ultimate application, of topological insulators, typically involve exposure to ambient conditions or their integration with metals, which lead to surface oxidation or material intermixing. X-ray photoelectron spectroscopy (XPS) measurements that demonstrate passivated and intermixing-free interfaces in the topological insulator BiTe by means of dry-transferred CVD graphene are reported. After air exposure, no traces of BiTe oxidation are found. Furthermore, it is demonstrated that graphene acts as a very efficient metal and chalcogen diffusion barrier in BiTe/graphene/permalloy (Py) heterostructures, which are relevant for spintronics. Such results are in stark contrast with the significant surface degradation observed in bare BiTe under ambient conditions and the deep Bi-Te bonding disruption that occurs in BiTe/Py heterostructures. These findings provide a new approach to control and engineer topological insulator interfaces for spintronic applications and a new platform to investigate the combined use of graphene and topological insulator Dirac states.
AB - The investigation, and ultimate application, of topological insulators, typically involve exposure to ambient conditions or their integration with metals, which lead to surface oxidation or material intermixing. X-ray photoelectron spectroscopy (XPS) measurements that demonstrate passivated and intermixing-free interfaces in the topological insulator BiTe by means of dry-transferred CVD graphene are reported. After air exposure, no traces of BiTe oxidation are found. Furthermore, it is demonstrated that graphene acts as a very efficient metal and chalcogen diffusion barrier in BiTe/graphene/permalloy (Py) heterostructures, which are relevant for spintronics. Such results are in stark contrast with the significant surface degradation observed in bare BiTe under ambient conditions and the deep Bi-Te bonding disruption that occurs in BiTe/Py heterostructures. These findings provide a new approach to control and engineer topological insulator interfaces for spintronic applications and a new platform to investigate the combined use of graphene and topological insulator Dirac states.
KW - Bi2Te3
KW - Graphene−topological insulator interface
KW - Intermixing
KW - Passivation
KW - XPS
UR - https://www.scopus.com/pages/publications/85144044619
U2 - 10.1002/admi.202201997
DO - 10.1002/admi.202201997
M3 - Article
SN - 2196-7350
VL - 9
JO - Advanced Materials Interfaces
JF - Advanced Materials Interfaces
IS - 36
ER -