Resum
The capacitance of the Al-SiO 2 (<60 A ̊)-Si(n)-Si(p + ) structure has been measured at different dc bias for several frequencies. The experimental capacitance decreases sharply as reverse dc bias is increased, passes through zero, and attains a negative value. A similar behaviour is observed at low frequencies when the structure is forward biased. This unusual behaviour is explaned considering the interaction of the carriers with the interface states at the I-S interface and the influence of the electric field on the tunnelling emission rate of these states. © 1985.
| Idioma original | Anglès |
|---|---|
| Pàgines (de-a) | 351-355 |
| Revista | Physica B+C |
| Volum | 129 |
| Número | 1-3 |
| DOIs | |
| Estat de la publicació | Publicada - 1 de gen. 1985 |
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