Nanoscale modification of H-terminated n-Si (100) surface in aqueous solution with an in situ electrochemical scanning tunnelling microscope

J.H. Ye; F. Pérez-Murano; N. Barniol; G. Abadal; X. Aymerich

Nanoscale modification of H-terminated n-Si (100) surface in aqueous solution with an in situ electrochemical scanning tunnelling microscope

J.H. Ye, F. Pérez-Murano, N. Barniol, G. Abadal, X. Aymerich

Departament de Física

Producció científica: Contribució a revista › Article › Recerca

Idioma original	Anglès
Pàgines (de-a)	17650-17652
Revista	Journal of Physical Chemistry
Número	99
Estat de la publicació	Publicada - 1 de gen. 1995

Com citar-ho

@article{b6853aa4f64746ee849bbb67546d9db5,

title = "Nanoscale modification of H-terminated n-Si (100) surface in aqueous solution with an in situ electrochemical scanning tunnelling microscope",

author = "J.H. Ye and F. P{\'e}rez-Murano and N. Barniol and G. Abadal and X. Aymerich",

year = "1995",

month = jan,

day = "1",

language = "English",

pages = "17650--17652",

number = "99",

}

TY - JOUR

T1 - Nanoscale modification of H-terminated n-Si (100) surface in aqueous solution with an in situ electrochemical scanning tunnelling microscope

AU - Ye, J.H.

AU - Pérez-Murano, F.

AU - Barniol, N.

AU - Abadal, G.

AU - Aymerich, X.

PY - 1995/1/1

Y1 - 1995/1/1

M3 - Article

SN - 0022-3654

SP - 17650

EP - 17652

JO - Journal of Physical Chemistry

JF - Journal of Physical Chemistry

IS - 99

ER -