Nanometer-scale leakage measurements in high vacuum on de-processed high-k capacitors

Keyphrases

• Nanometer Scale 100%
• High Vacuum 100%
• Capacitors 100%
• Leakage Assessment 100%
• Conductive Atomic Force Microscopy (C-AFM) 100%
• MOS Devices 33%
• Gate Dielectric 33%
• Removal Methods 33%
• Constant Voltage Stress 33%
• Current-voltage (I-V) Characteristics 33%
• Macroscopic Measurements 33%
• Local Current 33%
• Conductive AFM 33%
• Post-breakdown 33%
• Trap-assisted Tunneling 33%
• Oxide Breakdown 33%
• AFM Measurements 33%
• Microscopic Measurement 33%

Engineering

• Nanometre 100%
• Conductive Atomic Force Microscopy 100%
• Removal Process 33%
• Conductive 33%
• Constant Voltage 33%
• Gate Dielectric 33%
• Torr 33%
• Tunnel Construction 33%
• Current-Voltage Characteristic 33%

Material Science

• Capacitor 100%
• Atomic Force Microscopy 100%
• Current-Voltage Characteristic 33%
• Oxide Compound 33%
• Dielectric Material 33%