The authors report the fabrication of lateral metallic structures with multiple materials using specifically designed resist masks and multiangle shadow evaporation. The whole fabrication process is carried out without breaking vacuum, which avoids contamination and allows for highly controlled interface properties between metals deposited sequentially. The authors incorporate the thickness of the mask as a design parameter, which allows one to introduce controlled variations between multiple contacts in the same device. Using a suspended mask, it is demonstrated the fabrication of asymmetric single electron transistors with tunnel junctions with different resistances. Using a nonsuspended mask, it is illustrated the fabrication of an extended structure (a thermopile), which consists of tenths of ferromagnetic wires with a nominal width of 30 nm connected electrically in series using a nonmagnetic metal. © 2012 American Vacuum Society.
|Revista||Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics|
|Estat de la publicació||Publicada - 1 de gen. 2012|