Full water integration of NEMS on CMOS by nanostencil lithography

J. Arcamone; M.A.F. Van de Boogaart; F. Serra-Graells; Francisco Torres Canals; Gabriel Abadal Berini; Nuria Barniol Beumala; Francesc Xavier Perez Murano

doi:10.1109/IEDM.2006.346830

Full water integration of NEMS on CMOS by nanostencil lithography

J. Arcamone, M.A.F. Van de Boogaart, F. Serra-Graells, Francisco Torres Canals, Gabriel Abadal Berini, Nuria Barniol Beumala, Francesc Xavier Perez Murano

Departament d'Enginyeria Electrònica

Centre Nacional de Microelectrònica

Producció científica: Contribució a revista › Article › Recerca

8 Cites (Scopus)

Idioma original	Anglès
Pàgines (de-a)	1-1
Revista	Tech. dig., Int. Electron Devices Meet.
Volum	1
DOIs	https://doi.org/10.1109/IEDM.2006.346830
Estat de la publicació	Publicada - 1 de gen. 2006

Accés al document

10.1109/IEDM.2006.346830

Com citar-ho

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title = "Full water integration of NEMS on CMOS by nanostencil lithography",

author = "J. Arcamone and {Van de Boogaart}, M.A.F. and F. Serra-Graells and {Torres Canals}, Francisco and {Abadal Berini}, Gabriel and {Barniol Beumala}, Nuria and {Perez Murano}, {Francesc Xavier}",

year = "2006",

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day = "1",

doi = "10.1109/IEDM.2006.346830",

language = "English",

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issn = "0163-1918",

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AU - Arcamone, J.

AU - Van de Boogaart, M.A.F.

AU - Serra-Graells, F.

AU - Torres Canals, Francisco

AU - Abadal Berini, Gabriel

AU - Barniol Beumala, Nuria

AU - Perez Murano, Francesc Xavier

PY - 2006/1/1

Y1 - 2006/1/1

U2 - 10.1109/IEDM.2006.346830

DO - 10.1109/IEDM.2006.346830

M3 - Article

SN - 0163-1918

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JO - Tech. dig., Int. Electron Devices Meet.

JF - Tech. dig., Int. Electron Devices Meet.

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