Frequency dependence of degradation and breakdown of thin SiO2 films

M. Nafría, D. Yélamos, J. Suñé, X. Aymerich

Producció científica: Contribució a revista › Article › Recerca

Idioma original	Anglès
Pàgines (de-a)	257-261
Revista	Quality & Reliability Engineering International
Volum	11
Estat de la publicació	Publicada - 1 de gen. 1995

Com citar-ho

@article{ccd8b6f904c4415d9efb0c29a3bb2a3c,

title = "Frequency dependence of degradation and breakdown of thin SiO2 films",

author = "M. Nafr{\'i}a and D. Y{\'e}lamos and J. Su{\~n}{\'e} and X. Aymerich",

year = "1995",

month = jan,

day = "1",

language = "English",

volume = "11",

pages = "257--261",

journal = "Quality & Reliability Engineering International",

issn = "0748-8017",

publisher = "John Wiley and Sons Ltd",

}