Fabrication of submicrometric magnetic structures by electron-beam lithography

J. I. Martín; Y. Jaccard; A. Hoffmann; J. Nogués; J. M. George; J. L. Vicent; Ivan K. Schuller

doi:10.1063/1.368042

Fabrication of submicrometric magnetic structures by electron-beam lithography

J. I. Martín, Y. Jaccard, A. Hoffmann, J. Nogués, J. M. George, J. L. Vicent, Ivan K. Schuller

Departament de Física

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Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films. © 1998 American Institute of Physics.

Idioma original	Anglès
Pàgines (de-a)	411-415
Revista	Journal of Applied Physics
Volum	84
Número	1
DOIs	https://doi.org/10.1063/1.368042
Estat de la publicació	Publicada - 1 de jul. 1998

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10.1063/1.368042

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title = "Fabrication of submicrometric magnetic structures by electron-beam lithography",

abstract = "Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films. {\textcopyright} 1998 American Institute of Physics.",

author = "Mart{\'i}n, \{J. I.\} and Y. Jaccard and A. Hoffmann and J. Nogu{\'e}s and George, \{J. M.\} and Vicent, \{J. L.\} and Schuller, \{Ivan K.\}",

year = "1998",

month = jul,

day = "1",

doi = "10.1063/1.368042",

language = "English",

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journal = "Journal of Applied Physics",

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T1 - Fabrication of submicrometric magnetic structures by electron-beam lithography

AU - Martín, J. I.

AU - Jaccard, Y.

AU - Hoffmann, A.

AU - Nogués, J.

AU - George, J. M.

AU - Vicent, J. L.

AU - Schuller, Ivan K.

PY - 1998/7/1

Y1 - 1998/7/1

N2 - Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films. © 1998 American Institute of Physics.

AB - Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films. © 1998 American Institute of Physics.

UR - https://www.scopus.com/pages/publications/0032109128

U2 - 10.1063/1.368042

DO - 10.1063/1.368042

M3 - Article

SN - 0021-8979

VL - 84

SP - 411

EP - 415

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 1

ER -

Fabrication of submicrometric magnetic structures by electron-beam lithography

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