Fabrication of nanogaps for MEMS prototyping using focused ion beam as a lithographic tool and reactive ion etching pattern transfer

Maria Villarroya; Nuria Barniol; Cristina Martin; Francesc Pérez-Murano; Jaume Esteve; Lars Bruchhaus; Ralf Jede; Eric Bourhis; Jacques Gierak

doi:10.1016/j.mee.2007.01.074

Fabrication of nanogaps for MEMS prototyping using focused ion beam as a lithographic tool and reactive ion etching pattern transfer

Maria Villarroya, Nuria Barniol, Cristina Martin, Francesc Pérez-Murano, Jaume Esteve, Lars Bruchhaus, Ralf Jede, Eric Bourhis, Jacques Gierak

Departament d'Enginyeria Electrònica

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Resum

In this paper we present a different approach using a focused ion beam (FIB) as lithographic tool to define nanometric width gaps, which are then transferred to a silicon substrate by reactive ion etching (RIE). This process has been developed to fit the technological requirements for micro- and nano-electromechanicals systems (M-NEMS) applications. © 2007 Elsevier B.V. All rights reserved.

Idioma original	Anglès
Pàgines (de-a)	1215-1218
Revista	Microelectronic Engineering
Volum	84
DOIs	https://doi.org/10.1016/j.mee.2007.01.074
Estat de la publicació	Publicada - 1 de maig 2007

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10.1016/j.mee.2007.01.074

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title = "Fabrication of nanogaps for MEMS prototyping using focused ion beam as a lithographic tool and reactive ion etching pattern transfer",

abstract = "In this paper we present a different approach using a focused ion beam (FIB) as lithographic tool to define nanometric width gaps, which are then transferred to a silicon substrate by reactive ion etching (RIE). This process has been developed to fit the technological requirements for micro- and nano-electromechanicals systems (M-NEMS) applications. {\textcopyright} 2007 Elsevier B.V. All rights reserved.",

keywords = "FIB, Focused ion beam, NEMS, Nanogaps, Nanolithography",

author = "Maria Villarroya and Nuria Barniol and Cristina Martin and Francesc P{\'e}rez-Murano and Jaume Esteve and Lars Bruchhaus and Ralf Jede and Eric Bourhis and Jacques Gierak",

year = "2007",

month = may,

day = "1",

doi = "10.1016/j.mee.2007.01.074",

language = "English",

volume = "84",

pages = "1215--1218",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Fabrication of nanogaps for MEMS prototyping using focused ion beam as a lithographic tool and reactive ion etching pattern transfer

AU - Villarroya, Maria

AU - Barniol, Nuria

AU - Martin, Cristina

AU - Pérez-Murano, Francesc

AU - Esteve, Jaume

AU - Bruchhaus, Lars

AU - Jede, Ralf

AU - Bourhis, Eric

AU - Gierak, Jacques

PY - 2007/5/1

Y1 - 2007/5/1

N2 - In this paper we present a different approach using a focused ion beam (FIB) as lithographic tool to define nanometric width gaps, which are then transferred to a silicon substrate by reactive ion etching (RIE). This process has been developed to fit the technological requirements for micro- and nano-electromechanicals systems (M-NEMS) applications. © 2007 Elsevier B.V. All rights reserved.

AB - In this paper we present a different approach using a focused ion beam (FIB) as lithographic tool to define nanometric width gaps, which are then transferred to a silicon substrate by reactive ion etching (RIE). This process has been developed to fit the technological requirements for micro- and nano-electromechanicals systems (M-NEMS) applications. © 2007 Elsevier B.V. All rights reserved.

KW - FIB

KW - Focused ion beam

KW - NEMS

KW - Nanogaps

KW - Nanolithography

U2 - 10.1016/j.mee.2007.01.074

DO - 10.1016/j.mee.2007.01.074

M3 - Article

SN - 0167-9317

VL - 84

SP - 1215

EP - 1218

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Fabrication of nanogaps for MEMS prototyping using focused ion beam as a lithographic tool and reactive ion etching pattern transfer

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