TY - JOUR
T1 - Fabrication of highly regular suspended graphene nanoribbons through a one-step electron beam lithography process
AU - López-Suárez, Miquel
AU - Torres, Francesc
AU - Mestres, Narcís
AU - Rurali, Riccardo
AU - Abadal, Gabriel
PY - 2014/11/5
Y1 - 2014/11/5
N2 - © 2014 Elsevier Ltd. All rights reserved. A method to obtain pre-oriented large longitudinal 1-D arrays of identical suspended graphene nanoribbons is presented. Mechanical exfoliation from graphite was done in order to deposit single- and multiple-layered graphene over a Polymethyl-Methacrylate (PMMA) substrate, which is used as a sacrificial material. Electron beam lithography (EBL) is used to define the anchors and the suspended part of the structures. The method allows achieving a high number of graphene suspended nanoribbons with a very regular width and length. The main advantage of the method, from the process point of view, with respect to other standard procedures is that only one EBL step is needed in the whole sequence, so that the overall process is extremely simplified.
AB - © 2014 Elsevier Ltd. All rights reserved. A method to obtain pre-oriented large longitudinal 1-D arrays of identical suspended graphene nanoribbons is presented. Mechanical exfoliation from graphite was done in order to deposit single- and multiple-layered graphene over a Polymethyl-Methacrylate (PMMA) substrate, which is used as a sacrificial material. Electron beam lithography (EBL) is used to define the anchors and the suspended part of the structures. The method allows achieving a high number of graphene suspended nanoribbons with a very regular width and length. The main advantage of the method, from the process point of view, with respect to other standard procedures is that only one EBL step is needed in the whole sequence, so that the overall process is extremely simplified.
KW - EBL
KW - Graphene
KW - Nanofabrication
KW - Nanoribbons
KW - NEMS
UR - https://www.scopus.com/pages/publications/84926277535
U2 - 10.1016/j.mee.2014.07.022
DO - 10.1016/j.mee.2014.07.022
M3 - Article
SN - 0167-9317
VL - 129
SP - 81
EP - 85
JO - Microelectronic Engineering
JF - Microelectronic Engineering
IS - C
ER -