Do H-bond features of silica surfaces affect the H <inf>2</inf>O and NH <inf>3</inf> adsorption? Insights from periodic B3LYP calculations

Federico Musso, Piero Ugliengo, Mariona Sodupe

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The adsorption of a single H 2O and NH 3 molecule on different fully hydroxylated α-quartz, cristobalite, and tridymite surfaces has been studied at the B3LYP level of theory, within a periodic approach using basis sets of polarized triple-Χ quality and accounting for basis set superposition error (BSSE). Fully hydroxylated crystalline silica exhibits SiOH as terminal groups whose distribution and H-bond features depend on both the considered silica polymorph and the crystallographic plane, which gives rise to isolated, H-bond interacting SiOH pairs or infinitely connected H-bond chains. A key point of the present study is to understand how the H-bond features of a dry crystalline silica surface influence its adsorption properties. Results reveal that the silica-adsorbate (H 2O and NH 3) interaction energy anticorrelates with the density of SiOH groups at the surface. This counterintuitive observation arises from the fact that pre-existing H-bonds of the dry surface need to be broken to establish new H-bonds between the surface and the adsorbate, which manifests in a sizable energy cost due to surface deformation. A simple method is also proposed to estimate the strength of the pre-existing H-bonds at the dry surfaces, which is shown to anticorrelate with the adsorbate interaction energy, in agreement with the above trends. © 2011 American Chemical Society.
Idioma originalEnglish
Pàgines (de-a)11221-11228
RevistaJournal of Physical Chemistry A
Estat de la publicacióPublicada - 20 d’oct. 2011


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