CoFe<inf>2</inf>O<inf>4</inf>/buffer layer ultrathin heterostructures on Si(001)

R. Bachelet, P. De Coux, B. Warot-Fonrose, V. Skumryev, J. Fontcuberta, F. Sánchez

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Resum

Epitaxial films of ferromagnetic CoFe2O4 (CFO) were grown by pulsed laser deposition on Si(001) buffered with ultrathin yttria-stabilized zirconia (YSZ) layers in a single process. Reflection high-energy electron diffraction was used to monitor in real time the crystallization of YSZ, allowing the fabrication of epitaxial YSZ buffers with thickness of about 2 nm. CFO films, with thicknesses in the 2-50 nm range were subsequently deposited. The magnetization of the CFO films is close to the bulk value. The ultrathin CFO/YSZ heterostructures have very flat morphology (0.1 nm roughness) and thin interfacial SiOx layer (about 2 nm thick) making them suitable for integration in tunnel (e.g., spin injection) devices. © 2011 American Institute of Physics.
Idioma originalAnglès
Número d’article086102
RevistaJournal of applied physics
Volum110
DOIs
Estat de la publicacióPublicada - 15 d’oct. 2011

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