C-AFM Characterization of the Dependence of HfAlOx Electrical Behavior on Post Deposition Annealing Temperature.

X. Blasco, M. Nafría, X. Aymerich, J. Pétry, W. Vandervorst

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27 Cites (Scopus)

Idioma original	Anglès
Pàgines (de-a)	191-196
Revista	Microelectronic Engineering
Volum	72
Número	1-4
DOIs	https://doi.org/10.1016/j.mee.2003.12.035
Estat de la publicació	Publicada - 1 de gen. 2004

Accés al document

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title = "C-AFM Characterization of the Dependence of HfAlOx Electrical Behavior on Post Deposition Annealing Temperature.",

author = "X. Blasco and M. Nafr{\'i}a and X. Aymerich and J. P{\'e}try and W. Vandervorst",

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T1 - C-AFM Characterization of the Dependence of HfAlOx Electrical Behavior on Post Deposition Annealing Temperature.

AU - Blasco, X.

AU - Nafría, M.

AU - Aymerich, X.

AU - Pétry, J.

AU - Vandervorst, W.

PY - 2004/1/1

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