A study of etching conditions and resolution power of plastic detector CR-39

C. Domingo, M. Ortega, F. Fernández, A. Vidal-Quadras, J. L. Font, C. Baixeras, M. Casas

Producció científica: Contribució a revistaArticleRecercaAvaluat per experts

6 Cites (Scopus)

Resum

Two Pershore Stacks (32 h cure cycle and 1% DOP and 96 h cure cycle and no additive) have been exposed to the Berkeley Bevalac Argon beam at 285 MeV/nuc and 425 MeV/nuc, respectively. Optimum etching conditions have been found to be 70°C temperature and 18 h etching time in 6.25 N OHNa aquaeous solution, corresponding to a mean bulk etch rate VB = (1.37±0.09) μm/h. The charge and mass resolution power of the detector has been evaluated as ΔZ ≈ 0.3 e and ΔA ≈ 2 a.m.u.. © 1984.
Idioma originalAnglès
Pàgines (de-a)17-20
RevistaNuclear Tracks and Radiation Measurements (1982)
Volum8
Número1-4
DOIs
Estat de la publicacióPublicada - 1 de gen. 1984

Fingerprint

Navegar pels temes de recerca de 'A study of etching conditions and resolution power of plastic detector CR-39'. Junts formen un fingerprint únic.

Com citar-ho